tokuyama

Chemicals for use in industry; chemicals for use in the process of nano imprint lithography; acids used in industry; boron; oxides; chlorine; carbonates; alcohols for industrial purposes; organic halogenides; caustic sodas for industrial purposes; soda ashes; chlorides for industrial purposes; fluorides for industrial purposes; halides and halogen acid salts; chloro-silane (silicon tetrachloride, trichlorosilane, tetrachlorosilane); calcium chlorides; silicon dioxides for industrial purposes; sodium silicates for industrial purposes; ion- exchange resin membranes (chemical preparation); ionomer solutions for fuel cells; condensing agents other than for medical and veterinary purposes; protecting groups for amino groups (chemicals); aluminum nitrides for industrial purposes; aluminum nitride ceramics for industrial purposes; photochromic compounds for use in manufacturing plastic lens; chemical preparations used in plastics coating; unprocessed artificial and synthetic resins; polyvinylchloride resins for industrial purposes; polycrystalline silicons for industrial purposes; single-crystal sapphire for industrial purposes; electron beam resist for use in the manufacture of integrated circuits, semiconductor devices and other electronic devices; developers for removal of photoresist materials used in the manufacture of printed circuit boards; chemicals used for the surface treatment of metals; etching mordants for metals; chemicals used in the manufacture of solar batteries, solar cells or solar cell modules; metal detergents for use in manufacturing processes.